DOI: https://doi.org/10.26089/NumMet.v20r441

A nonlocal algorithm for analyzing the data of monochromatic optical control in the process of multilayer coating deposition

Authors

  • I.V. Kochikov
  • Yu.S. Lagutin
  • A.A. Lagutina
  • D.V. Lukyanenko
  • A.V. Tikhonravov
  • A.G. Yagola

Keywords:

numerical algorithms
experimental data analysis
thin film coatings
monochromatic optical control

Abstract

A new algorithm for determining the extrema in the dependence of the reflection coefficient on the optical thickness of the deposited layer is proposed. This reflection coefficient is measured during the deposition process of a multilayer coating. The proposed algorithm uses a physical model of the deposition process, which makes it possible to use all the measurement data accumulated by a recording device during the deposition of the layer in contrast to the classical approaches that adequately describe the dependence of the reflection coefficient only near its extremum. The efficiency of the proposed approach is shown by an example of modeling the deposition process for a 20-layer quarter-wave mirror.


Published

2020-01-11

Issue

Section

Section 1. Numerical methods and applications

Author Biographies

I.V. Kochikov

Yu.S. Lagutin

A.A. Lagutina

D.V. Lukyanenko

A.V. Tikhonravov

A.G. Yagola


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