https://doi.org/10.26089/NumMet.v27r332
Monochromatic monitoring of optical coatings production using multiple witness chips
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Abstract
The paper discusses the most important computational aspects for using multiple witness chips in the optical coating production with monochromatic monitoring. The application of monochromatic monitoring in the production of a complex narrow band pass filter is considered as an example. The selection of the number of witness chips, the division of filter layers into groups for monitoring by different chips, and the selection of monitoring wavelengths for each chip are discussed. Results from simulation experiments on filter production demonstrate the practical advantages of the proposed approach, in particular, the possibility of using an error self-compensation mechanism in monochromatic monitoring with on-line corrections of monitoring signal levels for terminating layer depositions.
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