High performance modeling of modern deposition processes for optical coating nanotechnology

Authors

  • A.V. Tikhonravov
  • I.V. Kochikov
  • T.V. Amotchkina
  • F.V. Grigoriev
  • O.A. Kondakova
  • V.B. Sulimov

Keywords:

high performance modeling
molecular dynamics
thin films
deposition processes

Abstract

Applicability of the method of molecular dynamics (MD) to the simulation of modern processes of deposition of optical coatings is studied. The choice of physical and technological aspects of deposition processes is explained and the most meaningful parameters of computer simulation are estimated. The first results of MD simulation of silica dioxide film growth are discussed. These results demonstrate good perspectives of high performance modeling of deposition processes.

New computational technologies

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Published

2012-10-15

Issue

Vol. 13 (2012): Issue 4.

Section

Section 1. Numerical methods and applications

Author Biographies

A.V. Tikhonravov

Lomonosov Moscow State University,
Research Computing Center
• Director

I.V. Kochikov

Lomonosov Moscow State University,
Research Computing Center
• Leading Researcher

T.V. Amotchkina

Lomonosov Moscow State University,
Research Computing Center
• Leading Researcher

F.V. Grigoriev

Lomonosov Moscow State University,
Research Computing Center
• Senior Researcher

O.A. Kondakova

Lomonosov Moscow State University,
Research Computing Center
• Senior Researcher

V.B. Sulimov

Lomonosov Moscow State University,
Research Computing Center
• Head of Laboratory

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