An algorithm of high performance modeling of optical nanocoating deposition processes
Authors
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F.V. Grigoriev
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I.V. Kochikov
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O.A. Kondakova
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V.B. Sulimov
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A.V. Tikhonravov
Keywords:
high performance modeling
molecular dynamics
thin films
silica dioxide
film deposition
Abstract
A new algorithm of high performance modeling of deposition processes for optical thin films deposition is proposed. The algorithm is based on the molecular dynamics simulation at the atomistic level, which allows one to analyze the structure of the film on the scales from 1 Angstrom to tens nanometers. The parameters of the algorithm are defined using the results of modeling the interaction of high-energy silicon atoms with silica dioxide. First results of modeling using the proposed algorithm are discussed.
Section
Section 1. Numerical methods and applications
References
- Kaiser N., Pulker H., Eds. Optical interference coatings. Berlin: Springer, 2003.
- Pulker H. Film deposition methods // Optical Interference Coatings. Edited by N. Kaiser and H. Pulker. Berlin: Springer, 2003. 131-153.
- Тихонравов А.В., Кочиков И.В., Амочкина Т.В., Григорьев Ф.В., Кондакова О.А., Сулимов В.Б. Суперкомпьютерное моделирование современных процессов напыления оптических нанопокрытий // Вычислительные методы и программирование. 2012. 13. 491-496.
- Тихонравов А.В., Кочиков И.В., Сулимов В.Б., Григорьев Ф.В., Кондакова О.А. Пространственные и временные эффекты при напылении оптических нанопокрытий оксида кремния // Вестник Моск. ун-та. Серия 3. Физика и астрономия. 2013. № 3. 80-83.
- Hoang V.V. Molecular dynamic simulation of amorphous SiO_2 nanoparticles // J. Phys. Chem. B. 2007. 111. 12649-12656.
- Von Alfthan S., Kuronen A., Kaski K. Realistic models of amorphous silica: a comparative study of different potentials // Phys. Rev. B. 2003. 68. 073203-073206.