An algorithm of high performance modeling of optical nanocoating deposition processes

Authors

  • F.V. Grigoriev
  • I.V. Kochikov
  • O.A. Kondakova
  • V.B. Sulimov
  • A.V. Tikhonravov

Keywords:

high performance modeling
molecular dynamics
thin films
silica dioxide
film deposition

Abstract

A new algorithm of high performance modeling of deposition processes for optical thin films deposition is proposed. The algorithm is based on the molecular dynamics simulation at the atomistic level, which allows one to analyze the structure of the film on the scales from 1 Angstrom to tens nanometers. The parameters of the algorithm are defined using the results of modeling the interaction of high-energy silicon atoms with silica dioxide. First results of modeling using the proposed algorithm are discussed.

New computational technologies

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Published

2013-06-28

Issue

Vol. 14 (2013): Issue 3.

Section

Section 1. Numerical methods and applications

Author Biographies

F.V. Grigoriev

Lomonosov Moscow State University,
Research Computing Center
• Leading Researcher

I.V. Kochikov

Lomonosov Moscow State University,
Research Computing Center
• Leading Researcher

O.A. Kondakova

Lomonosov Moscow State University,
Research Computing Center
• Senior Researcher

V.B. Sulimov

Lomonosov Moscow State University,
Research Computing Center
• Head of Laboratory

A.V. Tikhonravov

Lomonosov Moscow State University,
Research Computing Center
• Director

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